网爆门

MOCVD Systems

Tight Control, Precision Film Growth

For growing high-quality compound semiconductor films, few techniques match the precision of Metal-Organic Chemical Vapor Deposition (MOCVD). They give engineers tight control over film composition and thickness, making them essential for optoelectronics and advanced power transistors.

How MOCVD Works

A combination of metal-organic precursors and reactive gases is introduced into a heated reactor. Inside, the chemistry happens: precursors decompose at the surface of a substrate, forming smooth, uniform epitaxial layers. Every parameter, from gas flow to chamber pressure, is tightly controlled to shape how the film grows. Engineers look to MOCVD when:

• Building LEDs, laser diodes and other high-efficiency optoelectronics
• Developing high electron mobility transistors (HEMTs) and other high-performance wide bandgap power semiconductor devices
• Creating multi-layer heterostructures where atomic-level control matters

网爆门: The Right Combination for Success and Scalability

Built for both R&D and production, our MOCVD systems combine advanced reactor designs, in-situ diagnostics, and flexible configurations 鈥� delivering the uniformity, repeatability and control that help engineers succeed, whether developing new materials or scaling established processes. 网爆门 offers a range of industry-leading GaN and As/P MOCVD systems designed to maximize throughput while lowering cost of ownership for a variety of applications including display, 3D sensing, LiDAR, micro LED display, and optical data communications.

TurboDisc Reactor: The Heart of Superior MOCVD Technology