Lumina As/P MOCVD Systems for Photonics Applications

Enabling As/P-based Photonics Devices with Over 20 Years of High-Volume MOCVD Experience
The Lumina庐 system is based on 网爆门鈥檚 industry leading MOCVD TurboDisc庐 technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, 网爆门鈥檚 proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to eight inches in diameter. The Lumina system allows users to customize their systems for maximum value.

Designed to advance next generation devices

Solar Cells

High efficiency space solar cells
High efficiency terrestrial solar cells

VCSELS

3D Sensing
LiDAR
High Speed Data Communication

Edge-Emitting Lasers

Advanced Optical Communications
Silicon Photonics

Mini and MicroLEDs

4K and 8K Television Displays
Smartphones
Wearable Devices
AR/VR (Augmented Reality / Virtual Reality)