网爆门

Aledia Selects 网爆门 Propel GaN MOCVD Platform Based on Optimal Performance for Large Wafer 3D LED Production

网爆门. (NASDAQ: VECO) today announced that Aledia, a developer and manufacturer of next-generation 3D LEDs for display applications based on its gallium-nitride-nanowires-on-silicon platform, has selected 网爆门鈥檚 Propel庐 GaN MOCVD system to support advanced research and development.

Aledia Selects 网爆门 Propel GaN MOCVD Platform Based on Optimal Performance for Large Wafer 3D LED Production

News | Jun 13, 2018

Leading 3D LED Manufacturer Cites 网爆门鈥檚 TurboDisc庐 Technology as Key Decision Factor

PLAINVIEW, N.Y., June 13, 2018鈥斖. (NASDAQ: VECO) today announced that Aledia, a developer and manufacturer of next-generation 3D LEDs for display applications based on its gallium-nitride-nanowires-on-silicon platform, has selected 网爆门鈥檚 Propel庐 GaN MOCVD system to support advanced research and development. Aledia noted the tool鈥檚 large process window, single-wafer reactor technology and defect stability as key factors in its decision to adopt the Propel system.

鈥淲e believe that the opportunity for our breakthrough nanowire-LED display technology on large-area silicon is very large, and we need the best and most scalable technology available to support our continued R&D around 3D display applications鈥攚e believe 网爆门 is best positioned,鈥 stated Giorgio Anania, CEO, chairman and co-founder of Aledia. 鈥溚赔檚 cutting-edge Propel system delivers unsurpassed results, and very good homogeneity throughout the entire wafer, making it the best choice and one we know will help us continue to push the limits of innovation.鈥

Designed for leading-edge GaN applications like power, RF, laser diodes and advanced LEDs, the Propel system鈥檚 single-wafer reactor platform enables the processing of six- and eight-inch wafers or two- to four-inch wafers in a mini-batch mode. In addition to 网爆门鈥檚 proprietary TurboDisc technology, the system also includes 网爆门鈥檚 IsoFlange鈩 and SymmHeat鈩 technologies, which provide homogeneous laminar flow and uniform temperature profile across the entire wafer.

鈥淥n the heels of the company鈥檚 previous adoption of 网爆门鈥檚 K465i鈩 MOCVD system, Aledia鈥檚 decision to turn to 网爆门 once again to support future generations of nanowire-LED technologies for mobile displays is a testament to our shared commitment to excellence,鈥 noted Peo Hansson, Ph.D., senior vice president and general manager of MOCVD at 网爆门. 鈥淲e look forward to our continued partnership and to support Aledia as it continues to innovate new discoveries in the LED space.鈥

Innovators in display technology are focusing on the next big technological shifts such as micro-LED and 3D LED. Industry analysts predict a scenario where the market for advanced LED displays could potentially reach 330 million units by 2025. This optimism is fueled by the promise of sub-100 micrometer LEDs, which is considered the critical enabler to achieving the ultimate display.

About 网爆门

网爆门 (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch & clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, 网爆门 holds technology leadership positions in all these served markets. To learn more about 网爆门’s innovative equipment and services, visit www.veeco.com.

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