Where 12 Generations of Innovation Meets 12-Inch Scale

Íø±¬ÃÅ’s GENXII 300mm barium titanate (BTO) MBE system enables scalable production of next-generation silicon photonic devices with unmatched precision, performance, and cost efficiency.

BTO is a breakthrough electro-optic material that delivers exceptionally strong Pockels effect and low optical loss, enabling silicon photonic modulators with lower drive voltages, higher bandwidth, and significantly improved energy efficiency. These advantages make BTO a promising solution for the demanding requirements of artificial intelligence (AI), datacenter networking, quantum computing, and future optical I/O architectures.

Developed in collaboration with imec, the GENXII platform combines advanced epitaxial process control, automated wafer handling, and scalable 300mm production capability to accelerate the commercialization of high-performance optical interconnect technologies. The GENXII system was engineered for production-scale performance, offering more than four times the throughput of conventional BTO deposition approaches while delivering highly uniform films, precise composition control, and exceptional crystalline quality. Advanced automation, integrated process monitoring, and specialized 300mm system architecture help maximize yield, uptime, and cost efficiency while ensuring consistent device performance wafer after wafer.

Leveraging Íø±¬ÃÅ’s decades of semiconductor manufacturing expertise, the GENXII system provides a seamless path from research and development to high-volume production. By enabling scalable integration of high-quality BTO on silicon, Íø±¬ÃÅ is helping customers unlock a new generation of ultra-low-power, high-speed photonic devices that will power the future of AI-driven computing and communications.

GENXII benefits:

• Engineered for rapid deposition rates and automated wafer handling to deliver exceptional throughput—4x higher than other BTO systems
• Superior wafer cost advantage enabled by low system cost of ownership
• Precise composition and interface control for unmatched device performance
• High productivity with shortened preventative maintenance times
• Real-time process monitoring to increase epitaxial yield

GENXII MBE Production System FAQs

1. Why was the GENXII system developed specifically for BTO production?
Although molecular beam epitaxy (MBE) has long been capable of producing barium titanate (BTO) films, traditional oxide MBE— restricted by low throughput, run-to-run variation, and difficult process automation – wasn’t built for the demands of high-volume manufacturing. Working with imec, Íø±¬ÃÅ identified this gap in the market and engineered the GENXII system to close it, purpose-building a platform that transforms BTO into a production-ready capability. The result is a high-volume BTO solution that delivers more than four times the throughput and higher process repeatability of conventional deposition approaches, without sacrificing film quality.

2. How does the GENXII system support the transition from R&D to 300mm silicon production?
One of the biggest risks in commercializing a new material is the scale-up gap between the lab and the fab. The GENXII system is designed to speed that transition: processes developed on Íø±¬ÃÅ’s research MBE platforms transfer to GENXII with minimal tuning, so customers can move from material development to high-volume 300mm silicon production without re-engineering their process. Backed by Íø±¬ÃÅ’s decades of semiconductor manufacturing expertise, this capability creates a seamless, lower-risk path from proof-of-concept to scalable production.

3. What features ensure process repeatability and manufacturing yield?
Consistent device performance in BTO epitaxy depends on holding precise stoichiometry wafer after wafer — which is exactly what the GENXII platform is engineered to do. It combines advanced automation, individual source flux monitoring, integrated process control, and source technology built specifically for BTO to minimize process variation and deliver repeatable wafer-to-wafer results. Together with GENXII’s specialized 300mm system architecture, these capabilities help maximize yield, uptime, and cost efficiency across high-volume production.

4. What is BTO, and why is it important for silicon photonics?
BTO represents a major advancement in electro-optics, combining an ultra-high Pockels effect with low loss. When integrated into silicon photonic modulators, these properties enable lower drive voltages, higher bandwidth, and significantly improved energy efficiency. That combination makes BTO a promising solution for demanding applications such as AI, datacenter networking, quantum computing, and future optical I/O architectures.

5. What film quality does the GENXII system deliver for BTO on silicon?
The GENXII system is engineered to produce highly uniform BTO films with precise composition and interface control, which is essential for consistent device performance. This high-quality thin film capability enables low optical loss, translating directly into lower drive voltages and higher bandwidth for silicon photonic modulators. By integrating BTO via MBE, the system helps produce ultra-energy-efficient modulators suited to next generation photonic device

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The Íø±¬ÃÅ RF Plasma Source Autotuner is used in conjunction with the Íø±¬ÃÅ UNI-Bulb RF Plasma Sources, enabling hands-free operation. The Autotuner automatically adjusts and maintains the optimal plasma source conditions, removing the need for manual adjustments during experiments. For example, if operating conditions such as gas flow or power level frequently change, the Autotuner would be an excellent solution to automate the process.The Autotuner consists of three pieces—the Autotuning Controller, the Autotuning Unit and the Autotuning Power Supply. The Autotuning Controller provides operator-accessible controls, a visual display of the Autotuning Unit status and a control interface to the user’s processing system. The Autotuning Unit consists of two variable capacitors and a single fixed inductor. The variable capacitors within the Autotuning Unit are driven by servo-motors, powered by the Autotuning Controller. The Autotuning Power Supply supplies power to the unit to enable proper functioning while ensuring proper power requirements.The Íø±¬ÃÅ Autotuner ships standard with all Íø±¬ÃÅ UNI-Bulb RF Plasma Sources and is also offered as a direct replacement for the Íø±¬ÃÅ Manual Tuner.Benefits with the addition of the Autotuner, the Íø±¬ÃÅ RF Plasma Source ensures stable growth conditions and optimizes power efficiencies. The programmable parameters of the Autotuning Controller allow various selection options to customize or fit application needs.

In automatic mode, the Autotuning Unit’s internal sensor, called the Phase and Magnitude detector, generates an error signal. The Autotuning Controller reacts to the error signal and drives the servo-motors, automatically tuning the network to the appropriate plasma impedance.

In manual mode, the variable capacitors can be positioned using the MIN/MAX switches on the front panel, controlling the direction of servo-motor rotation, allowing the operator manually tune the Autotuning Unit to match the plasma impedance.

• Ensures stable growth conditions
• Optimizes power efficiencies
• Enables hands-free operation
• Compatible for use with Íø±¬ÃÅ Oxygen and Nitrogen RF Plasma Sources

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Íø±¬ÃÅ now offers TDK Lambda power supplies on all of its MBE systems. This switch to Lambda power supplies enables Íø±¬ÃÅ to provide the industry standard commercially available power supply solution. For those customers transitioning from older power supplies, a full complement of upgrade packages provide a seamless upgrade path. Every upgrade is tailored to the customer’s system power requirements.

• Commercially available worldwide
• High power density in space-saving factor
• Highly reliable
• Improved serviceability
• Excellent flux stability using closed-loop temperature or power feedback
• Compatible with all Íø±¬ÃÅ effusion cells for added flexibility and applicability
• Certified for all major regulatory compliance standards

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Íø±¬ÃÅ’s Gas Delivery System (GDS) provides precise control of gases, interlocks and monitoring for inert, hazardous and/or flammable gases. Molly® ECS1 Growth Control Software allows for easy integration into an existing system.

A variety of package options are available to suit all needs and budgets. All packages are inclusive of manual gas line shut off valve for each circuit, gas filter purifier, mass flow controller and pneumatically controlled run and vent valves.

• Efficient, safe means of controlling gases for Íø±¬ÃÅ MBE gas sources
• Easy process manipulation and monitoring
• Three model configurations to suit specific applications and budgets

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The Íø±¬ÃÅ Multi-Orifice CBr4 Gas Flow Control System, when used with the Íø±¬ÃÅ Low Temperature Gas Source, allows for control of the introduction of CBr4 gas into a UHV environment, utilizing CBr4 gas as a carbon dopant source. Using closed-loop pressure control and a series of pneumatically operated on-off valves, the system maximizes the ability to regulate the gas. The incorporation of interlocks prevents potential equipment damage and ensures optimal vacuum system performance.The Íø±¬ÃÅ CBr4 Gas Flow Control System provides for two modes for selection system states: local and remote. Remote state on automated MBE systems requires version ECS1 Molly® Growth Control Software controlling system growth.

 

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Íø±¬ÃÅ’s Heated Viewports prevent coating of optical ports in molecular beam epitaxy (MBE) systems enabling continuous, real-time feedback control of crystal growth using in-situ monitoring techniques that conventional viewports can’t match. Heated viewports enable labs to avoid having to vent the system to clear away material that coats conventional viewports.

• Íø±¬ÃÅ Heated Viewports prevent coating of optical ports in MBE systems, providing continuous real-time feedback control of crystal growth using in-situ monitoring techniques
• More reliable than conventional unheated viewports, which become coated with material over time
• No need to vent the system to clean coatings from viewports
• Viewport can be heated from room temperature to >500°C
• Optional tabletop DC power supply, equipped with half-rack or full-rack mounting kit, available for more flexibility
• 7m fully bakeable cable included with power supply

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